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11 Jun 2015

2016 Workspace Program Artist Residency Opportunity

Workspace Program
Dieu Donne


Residency opportunity for New York State emerging artists to work collaboratively with handmade paper

Bridget Donlon

Dieu Donne
315 West 36th Street
New York, NY 10018
United States

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With a focus on experimentation and collaboration, Dieu Donné founded the Workspace Program in 1990 to provide emerging, New York State based artists with the opportunity to explore hand papermaking as an artistic medium. The program encourages emerging artists to explore the creative possibilities inherent in the hand papermaking process, and to develop this medium as a contemporary art form.

The Dieu Donné Workspace Program residency includes introduction to the medium and process and days in the studio with a dedicated papermaking collaborator. Each artist is paired with a master papermaker creating a unique collaborative experience where a new medium can be quickly learned and put into practice. Experimentation is highly encouraged throughout the residency.

Artists apply for the Workspace Program residency through an online application form (available June 10-July 10, 2015), which requires answering a few short questions and providing a current resume and up to 10 images. A changing panel of curators, critics, and art professionals select finalists based on the quality of the work samples. These individuals are then interviewed by the Dieu Donné artistic staff for selection of the final residency artists.

The Workspace Program is open to emerging artists who live and work in New York State. Artists from all disciplinary and cultural backgrounds are encouraged to apply. Applications will not be accepted from students enrolled in undergraduate or graduate degree programs during the program year (July 2015 - June 2016). Applicants must be New York State residents and must be U.S. citizens or permanent residents of the U.S. No prior papermaking experience is required. Applications are only accepted via our online application; please do not mail or e-mail application materials.