HISK Open Studios & Call for Applications
Open Studios & Call for Applications
Friday May 11, 2012 — 14:00 > 20:00
Saturday May 12, 2012 — 14:00 > 20:00
Sunday May 13, 2012 — 14:00 > 20:00
Monday May 14, 2012 — 14:00 > 20:00
Deadline submission applications for working years 2013-2014: June 15, 2012
HISK – Hoger Instituut voor Schone Kunsten / Higher Institute for Fine Arts
Advanced Studies & Practice-based Research in Visual Arts
The HISK offers a postacademic course in audiovisual and visual art. The institute provides 24 young artists from Belgium and abroad with a studio of their own for two years.
The emphasis at the institute lies on individual practice. The programme aims to achieve a practical balance between study in the studio, discussions with visiting lecturers, workshops, reading groups, field trips and public presentations. The international and culturally diverse composition of the candidate laureate group makes for cross-pollination and dialogue.
The diversity of the international visiting lecturers (artists, curators, critics, theoreticians...), provides a framework within which the candidate laureates learn to view their own work with a critical eye. The unique HISK concept allows participants every opportunity to invest in critical research for their work within a broader artistic, cultural and societal context.
At the end of the two years, the artist receives a 'Laureate of the Higher Institute for Fine Arts' certificate.
Since 1997, 184 laureates have graduated from the institute. The majority of them are now pursuing successful professional careers in the international art world.
Federico Acal ES, Rebecca Armstrong US, Sara Bjarland FI, Line Boogaerts BE, Liudvikas Buklys LT, Joachim Coucke BE, Alice De Mont BE, Andris Eglitis LV, Ieva Epnere LV, Paulien Föllings NL, Hamza Halloubi MA, Erika Hock DE, Katrin Kamrau DE, Conny Kuilboer NL, Gary Leddington GB, Clare Noonan NZ, Suat Ögüt TR, Odilon Pain FR, Daniel Rödiger DE, Meggy Rustamova BE, Jeroen Uyttendaele BE, Ben Van den Berghe BE, Patrick Wokmeni CM.
Friday May 11 till Monday May 14, 2012, 14:00 > 20:00
The first of the two working year starts in January 2013 and ends in December 2013.
Artists who have already obtained a Masters degree in Fine Art or an equivalent qualification are eligible to apply to the HISK. Exceptions can be made for applicants who do not have a Master degree but display a high level of development, motivation and artistic affinity.
The admission committee is composed of international visiting lecturers from a variety of backgrounds. They make a pre-selection from the submitted portfolios, and the candidates who make it through are invited for an interview regarding their motivations and expectations. After a period of evaluation and careful consideration, the committee then makes a decision as to whether the applicant is suitable.
The conceptual and visual qualities in the works submitted by applicants are considered to be more important than style, material or technique. Participants are expected to have a strong commitment to conducting critical research within their respective fields of interest. At the same time, they should aim towards locating their practice within a broader perspective of social and cultural environments. Candidates are also expected to make a contribution to the activities of the HISK as a whole. This interaction is seen to be an important forum of exchange and development.
Application candidatures 2013-2014
All applicants have to
• Fill in the online application form (www.hisk.edu / application / application form)
• Send the following to HISK, Charles de Kerchovelaan 187a, 9000 Gent, Belgium
o A suitable beamer presentation (Power Point) on CD (Mac compatible)
o A print out of the presentation (in colour or in black & white)
o Films and videos on DVD, if possible with menu
o A detailed Curriculum Vitae including a list of exhibitions, grants, scholarships, awards, commissions …
o Catalogues and texts describing your artistic work (optional)
o A copy of your ID card or passport
o A recent passport photograph (digital if possible)
o A copy of your undergraduate or/and graduate diploma
o Maximum 3 letters of recommendation (optional)`
Deadline submission: JUNE 15, 2012 (postmark)
An international jury will make a selection in July 2012 of 12 artists and maximum 5 reserves. The results of the selection will be known on July 12, 2012 at the latest.
Applicants who have not been selected can collect their documents at the HISK's administration office on conclusion of the admission procedure. Documentation of selected candidates will be archived in the HISK's records. As careful as the HISK may be in handling the documentation submitted, we cannot be held responsible for any loss or damage.
The registration fee amounts to 2000 euros / year (+ a single deposit of 300 euros). Health insurance is not included in the registration fee. The registration fee (and the deposit) are payable before the start of the working year.
The Higher Institute of Fine Arts offers a private work space and pedagogical guidance. There are no scholarships or residencies available. Living costs are the participants' own responsibility. Foreign candidate-laureates have to arrange all the necessary administration themselves in order to obtain a visa for study purposes and an official residence permit.
Hoger Instituut voor Schone Kunsten
Higher Institute for Fine Arts
Charles de Kerchovelaan 187a